IES will co-host the EVG Nanoimprint Lithography (NIL) Technology Day UK 2023.
Taking place on Wednesday, November 29, 2023, at the Apex Hotel in Bath, EVG NIL Technology Day UK 2023 will showcase the latest trends in AR/VR, Silicon Photonics, Automotive and Meta Lenses.
Our Equipment Partners Division represents EVG in the UK & Ireland, and several other micro & nanoscale technology providers. We have supported EVG with the arrangements for this event, contacting relevant customers to ensure there is a diverse audience of both researchers and manufacturers using or interested in the NIL technology.
EV Group (EVG) – the leading supplier of high-volume production equipment to semiconductor manufacturing – has consistently used its NIL Technology Day to lower the barriers to the adoption of Nanoimprint Lithography (NIL) for wafer-level and panel-level production applications. Its 2021 event saw the launch of its first-of-its-kind step-and-repeat mastering services for NIL.
EVG NIL Technology Day UK 2023 will feature a full day’s speaker programme. Following registration at 9.30am, IES’s Rick Halle and EVG Regional Sales Manager Robert Eichinger-Heue will welcome delegates before presentations from EVG, the University of Bath, supply chain partners and industrial customers including Micro Resist Technology (MRT), NILT, Oxford Instruments and WaveOptics (Snap Inc.).
Registration for the ticketed event is free of charge and required by November 20, 2023. After registering, attendees will receive a booking confirmation and more information by email. Registration can be made at EVG's website here.
Rick Halle, IES Equipment Partners Business Development Manager, said: “IES is thrilled to co-host this visionary and innovative annual event with our long-standing partner, EVG. The NIL Technology Day is the pre-eminent forum to discuss pioneering products and processes and the latest developments in AR/VR, Silicon Photonics, Automotive and Meta Lenses. We are looking forward to sharing a platform with EVG and offering insight into the capabilities of the latest NIL technology; delivering advantages for both research and industry.”