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Q150 Microwave Plasma Etcher

Quartz chamber with 150mm chamber diameter and 6L volume.

Description:

Alpha Plasma Microwave Plasma Etcher Systems series provide fast and damage free plasma processing. In these plasma systems the plasma effect is based on chemical reactions of reactive plasma particles. The systems are easy to operate and feature simplest loading and unloading, manually as well as automatically.

The system software is based on Windows and complies with standards in semiconductor industries.

The microwave generators are small and reliable. They allow a very compact design of low pressure plasma systems without the need of amplifiers and matching networks which are necessary for the conventional RF technology. The Q Series systems can be prepared for the installation in a cleanroom wall as well as a table top. The system is suitable for wafers up to 125mm and designed for semiconductor and microelectronics industry.

Applications:

  • Photoresist processing;

  • Isotropic low-damage plasma etch;

  • Dry etch surface preparation;

  • SU8 and other epoxy based resists;

  • Sacrificial layers for MEMS.

Features:

  • Efficient microwave plasma cleaning

  • Small footprint for R&D purposes

  • 2.45GHz microwave power adjustable between 50 and 600 Watts

  • Up to 4 mass flow controllers

  • Automatic and manual operation

  • Substrate size up to 5 inch